Voltage waveform generator for plasma assisted processing apparatuses

Voltage waveform generator for plasma assisted processing apparatuses A voltage waveform generator for a plasma assisted processing 5 apparatus comprises a common node, a voltage supply circuit operable to switch between at least two voltage levels at a first switch node, a first inductor connected...

Full description

Saved in:
Bibliographic Details
Main Authors JORDI EVERTS, NOUD SLAATS
Format Patent
LanguageEnglish
Published 18.03.2022
Subjects
BASIC ELECTRIC ELEMENTS
BASIC ELECTRONIC CIRCUITRY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
PULSE TECHNIQUE
Online AccessGet full text

Cover

More Information
Summary:Voltage waveform generator for plasma assisted processing apparatuses A voltage waveform generator for a plasma assisted processing 5 apparatus comprises a common node, a voltage supply circuit operable to switch between at least two voltage levels at a first switch node, a first inductor connected between the first switch node and the common node, and a control unit configured to operate the voltage supply circuit.
Bibliography:Application Number: NL20202026072