PELLICLE FOR EUV LITHOGRAPHY

The invention relates to a pellicle for a lithographic apparatus. The pellicle comprises at least one metal nitride layer and a metallic capping layer disposed on the at least one metal nitride layer. The at least one metal nitride layer may comprise ruthenium, molybdenum, boron, zirconium, titanium...

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Bibliographic Details
Main Authors STEPHANE MARTEL, PIETER-JAN VAN ZWOL, MICHAEL ALFRED JOSEPHUS KUIJKEN, MAXIM ALEKSANDROVICH NASALEVICH, DENNIS DE GRAAF, KEVIN KORNELSEN, MAXIME BIRON, JAN HENDRIK WILLEM KUNTZEL, PAUL JANSSEN, THIJS KATER, GUIDO SALMASO, RICHARD BEAUDRY
Format Patent
LanguageEnglish
Published 14.01.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a pellicle for a lithographic apparatus. The pellicle comprises at least one metal nitride layer and a metallic capping layer disposed on the at least one metal nitride layer. The at least one metal nitride layer may comprise ruthenium, molybdenum, boron, zirconium, titanium, tantalum, 5 or combinations thereof, such as titanium nitride and/or tantalum nitride. The metallic capping layer may comprises ruthenium, molybdenum, boron, zirconium, titanium, tantalum, or combinations thereof, preferably ruthenium. The invention further relates to the use of such a pellicle in a lithographic apparatus.
Bibliography:Application Number: NL20202025267