APPARATUS FOR CONTROLLING INTRODUCTION OF EUV TARGET MATERIAL INTO AN EUV CHAMBER

Apparatus for controlling introduction of EUV target material into an EUV chamber in which a flow restrictor orifice is placed in a flow path of target material through the droplet generator, for example, at a position upstream of a filter within the droplet generator. Also, a liquid tin sensor, for...

Full description

Saved in:
Bibliographic Details
Main Authors BENJAMIN ANDREW SAMS, DIETMAR UWE HERBERT TREES, GEORGIY O. VASCHENKO
Format Patent
LanguageEnglish
Published 10.07.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:Apparatus for controlling introduction of EUV target material into an EUV chamber in which a flow restrictor orifice is placed in a flow path of target material through the droplet generator, for example, at a position upstream of a filter within the droplet generator. Also, a liquid tin sensor, for example, a conduction probe or electrical load detector, which may be located in the volume of a droplet generator heater blocks. The flow restrictor can be configured to serve additionally as a seal, for example, for the filter. Thus, the flow restrictor can be configured as a metal disk that can also serve as a sealing gasket. For example, the metal may be unannealed tantalum, tantalum-tungsten alloy, annealed molybdenum, molybdenum- rhenium alloy, or annealed rhenium.
Bibliography:Application Number: NL20192024324