A lithographic apparatus and cooling apparatus

A lithographic apparatus comprising: a projection system configured to project a patterned radiation beam Via a projection path onto an exposure area at a substrate held on a substrate table that is moveable in a region underneath the projection system; and a cooling apparatus configured to cool the...

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Bibliographic Details
Main Authors ADRIANUS HENDRIK KOEVOETS, EVERT AUKE RINZE WESTERHUIS, NAFISEH TALEBAN FARD
Format Patent
LanguageEnglish
Published 09.01.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus comprising: a projection system configured to project a patterned radiation beam Via a projection path onto an exposure area at a substrate held on a substrate table that is moveable in a region underneath the projection system; and a cooling apparatus configured to cool the substrate Via heat transfer from the substrate to a cooling element positioned above the substrate and adjacent the projection path; Wherein the cooling apparatus comprises a membrane system positioned in the projection path so as to physically separate the projection system from the region.
Bibliography:Application Number: NL20192023213