A Substrate Holder for use in a Lithographic Apparatus

The invention relates to a substrate holder comprising a main body formed of a conductive material from which a plurality of burls are projecting; an insulation layer disposed on at least the distal ends of a group of these burls; and a hard layer resistant to wear disposed on the insulation layer....

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Bibliographic Details
Main Authors NICOLAAS TEN KATE, LUCAS HENRICUS JOHANNES STEVENS
Format Patent
LanguageEnglish
Published 08.05.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a substrate holder comprising a main body formed of a conductive material from which a plurality of burls are projecting; an insulation layer disposed on at least the distal ends of a group of these burls; and a hard layer resistant to wear disposed on the insulation layer. The invention further relates to a substrate holder comprising a main body formed of an insulating material from which a plurality of burls are projecting; a hard layer resistant to wear disposed on and localised to the distal ends of a group of these burls. The invention further relates to a lithographic apparatus comprising any of these substrate holders.
Bibliography:Application Number: NL20192023007