Image Sensor for Immersion Lithography

An image sensor for immersion lithography, the image sensor comprising: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor; wherein a protective layer is provided between the absorber laye...

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Bibliographic Details
Main Authors AREND JOHANNES DONKERBROEK, JOHAN FRANCISCUS MARIA BECKERS, NIRUPAM BANERJEE, SANDRO WRICKE
Format Patent
LanguageEnglish
Published 06.05.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An image sensor for immersion lithography, the image sensor comprising: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor; wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
Bibliography:Application Number: NL20192022955