PARTICLE SUPPRESSION SYSTEMS AND METHODS

An object stage can include a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. And the obj...

Full description

Saved in:
Bibliographic Details
Main Authors DANIEL NATHAN BURBANK, YANG-SHAN HUANG, MARCO KOERT STAVENGA
Format Patent
LanguageEnglish
Published 01.02.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:An object stage can include a first structure and a second structure movable relative to the first structure. The second structure is configured to support an object. The object stage also includes a seal plate movably coupled to the first structure or the second structure, but not both. And the object stage includes at least one actuator configured to move the seal plate such that a substantially constant gap is defined between the seal plate and the first structure or the second structure that is not coupled to the seal plate.
Bibliography:Application Number: NL20182021333