A System for Cleaning a Substrate Support, a Method of Removing Matter from a Substrate Support, and a Lithographic Apparatus

• Main Authors: TJARCO LINDEIJER, BERT DIRK SCHOLTEN, TIANNAN GUAN, ANDRÉ SCHREUDER
• Format: Patent
• Language: Dutch
• Published: 13.12.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A system for cleaning a substrate support comprising a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system comprising: a treatment tool arranged for relative movement in a second direction orthogonal to the 5 first direction and a third direction orthogonal to the first direction and the second direction over the terminal surfaces of the projections thereby to remove matter from the substrate support; a controller adapted to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another. 10 A system for cleaning a substrate support having a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system including: a treatment tool arranged for relative movement in a second direction orthogonal to the first direction and a third direction orthogonal to the first and second directions over the terminal surfaces of the projections to remove matter from the substrate support; and a controller to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another.