LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD

The present invention relates to a lithographic apparatus, comprising: - a primary frame which is provided with a functional unit, - a secondary frame, 5 - a primary frame support, which is adapted to support the primary frame onto the secondary frame, - a flexible utility connection, adapted to con...

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Bibliographic Details
Main Authors MAURICE WILLEM JOZEF ETIËNNE WIJCKMANS, JEROEN PIETER STARREVELD
Format Patent
LanguageEnglish
Published 03.09.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention relates to a lithographic apparatus, comprising: - a primary frame which is provided with a functional unit, - a secondary frame, 5 - a primary frame support, which is adapted to support the primary frame onto the secondary frame, - a flexible utility connection, adapted to connect the functional unit to an auxiliary system, - a vibration isolation body having a body mass, which is moveably connected to the secondary frame by a flexible passive body support having a body support stiffness, 10 wherein the flexible utility connection is fixed to the vibration isolation body at a distance from the primary frame.
Bibliography:Application Number: NL20182020346