RETICLE CLAMPING DEVICE
Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holdi...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
22.08.2018
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Subjects | |
Online Access | Get full text |
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Summary: | Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a 5 reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device. |
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Bibliography: | Application Number: NL20182020281 |