A FLUID HANDLING STRUCTURE AND LITHOGRAPHIC APPARATUS

A lithographic immersion apparatus comprises a fluid handling structure and a device manufacturing method. In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprises a gas knife system, the gas knife system comprising passages each having an exi...

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Main Authors PATRICK JOHANNES WILHELMUS SPRUYTENBURG, RUUD OLIESLAGERS, MIAO YU, THEODORUS WILHELMUS POLET, CORNELIUS MARIA ROPS, JOHANNES CORNELIS PAULUS MELMAN, ERIK HENRICUS EGIDIUS CATHARINA EUMMELEN, GIOVANNI LUCA GATTOBIGIO, HAN HENRICUS ALDEGONDA LEMPENS, ARTUNÇ ULUCAN
Format Patent
LanguageEnglish
Published 21.07.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic immersion apparatus comprises a fluid handling structure and a device manufacturing method. In an embodiment, the fluid handling structure is configured to confine immersion fluid to a region and comprises a gas knife system, the gas knife system comprising passages each having an exit, the passages comprising a plurality first passages having a plurality of corresponding first exits, and a plurality of second passages having a plurality of corresponding second exits, wherein at least one first passage and at least one second passage are configured such that the stagnation pressure of gas exiting the first exit is greater than the stagnation pressure of gas exiting the second exit, wherein the plurality of first passages and the plurality of second passages are intermingled and arranged in a line such that the first exits and the second exits form a side of a shape in plan view.
Bibliography:Application Number: NL20162017952