A Lithographic System and Method
A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter con...
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Main Authors | , , , , |
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Format | Patent |
Language | Dutch English |
Published |
28.06.2017
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Subjects | |
Online Access | Get full text |
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Summary: | A system comprises a first radiation source configured to provide a first radiation beam, at least one splitter configured to split the first radiation beam into a first plurality of sub-beams, a second radiation source configured to provide a second radiation beam, at least one further splitter configured to split the second radiation beam into a second plurality of sub-beams, and a switch assembly, wherein the switch assembly is configured to receive a first sub-beam which is one of the first plurality of sub-beams; receive a second sub-beam which is one of the second plurality of sub-beams, in a first configuration to transmit the first sub-beam along a desired path, and in a second configuration to transmit the second sub-beam along said desired path. |
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Bibliography: | Application Number: NL20162017840 |