PATTERNING DEVICE COOLING SYSTEMS IN A LITHOGRAPHIC APPARATUS

A lithographic apparatus includes a patterning device support structure configured to support a patterning device, a gas inlet configured to provide a gas flow across a surface of the patterning device, and a temperature conditioning device configured to condition the temperature of the gas flow bas...

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Bibliographic Details
Main Authors CHRISTOPHER CHARLES WARD, MARC LÉON VAN DER GAAG, LAURENTIUS JOHANNES ADRIANUS VAN BOKHOVEN, JOHAN GERTRUDIS CORNELIS KUNNEN
Format Patent
LanguageEnglish
Published 19.01.2017
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus includes a patterning device support structure configured to support a patterning device, a gas inlet configured to provide a gas flow across a surface of the patterning device, and a temperature conditioning device configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor configured to measure a parameter indicative of an amount of heat added to the patterning device and a volume between the patterning device and a lens of a projection system during operational use of the lithographic system. Further, the apparatus includes a controller operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.
Bibliography:Application Number: NL20162016984