LITHOGRAPHIC APPARATUS

The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

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Main Authors SCACCABAROZZI LUIGI, WINTER LAURENTIUS, RIZO DIAGO PEDRO, DHALLUIN FLORIAN DIDIER ALBIN, ARIAS ESPINOZA JUAN DIEGO, BROUNS DERK SERVATIUS GERTRUDA, WILEY JAMES NORMAN
Format Patent
LanguageEnglish
Published 30.09.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
AbstractList The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
Author BROUNS DERK SERVATIUS GERTRUDA
DHALLUIN FLORIAN DIDIER ALBIN
RIZO DIAGO PEDRO
ARIAS ESPINOZA JUAN DIEGO
SCACCABAROZZI LUIGI
WINTER LAURENTIUS
WILEY JAMES NORMAN
Author_xml – fullname: SCACCABAROZZI LUIGI
– fullname: WINTER LAURENTIUS
– fullname: RIZO DIAGO PEDRO
– fullname: DHALLUIN FLORIAN DIDIER ALBIN
– fullname: ARIAS ESPINOZA JUAN DIEGO
– fullname: BROUNS DERK SERVATIUS GERTRUDA
– fullname: WILEY JAMES NORMAN
BookMark eNrjYmDJy89L5WQQ8_EM8fB3D3IM8PB0VnAMCHAMcgwJDeZhYE1LzClO5YXS3Azybq4hzh66qQX58anFBYnJqXmpJfF-PkYGhkbGZkaOxoRVAAARNCA4
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID NL2012362A
GroupedDBID EVB
ID FETCH-epo_espacenet_NL2012362A3
IEDL.DBID EVB
IngestDate Fri Aug 23 06:55:51 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_NL2012362A3
Notes Application Number: NL20142012362
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140930&DB=EPODOC&CC=NL&NR=2012362A
ParticipantIDs epo_espacenet_NL2012362A
PublicationCentury 2000
PublicationDate 20140930
PublicationDateYYYYMMDD 2014-09-30
PublicationDate_xml – month: 09
  year: 2014
  text: 20140930
  day: 30
PublicationDecade 2010
PublicationYear 2014
RelatedCompanies ASML NETHERLANDS B.V
RelatedCompanies_xml – name: ASML NETHERLANDS B.V
Score 2.9445329
Snippet The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title LITHOGRAPHIC APPARATUS
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140930&DB=EPODOC&locale=&CC=NL&NR=2012362A
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwdR3LToNAcFLr86ZoU98eDDciZbeLHoihPKSGAkFqemvKK_VSG8H4-86uoF563Ulmdyc778cC3KpE01mpawodoAikPND0kJJUuWesVBk-kEXJ45CTgHlT-jwbzjqwbHthxJzQLzEcETkqQ36vhbxe_wWxbFFbWd2lb7j0_ugmhi033jGf3kRU2R4ZThTaoSVblhH4chBzmIay2tyCbW5E8yn7zuuI96Ss_ysU9xB2IsS1qo-gU6wk2Lfaf9ck2Js06W4JdkV9ZlbhYsOD1TH0_HHihU-xGXlj68aMIjM2k-nLCVy7TmJ5Cm41_73VPPDbM5EedNHXL_q8g5oMUcdTni6jVM8W-WDAMp1ouY6mRl6eQn8TlrPNoHM44LT5KXO4gG798Vlcoi6t0ytBhm-7CXOR
link.rule.ids 230,309,786,891,25594,76906
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwdR3JToNA9KXWpd4UbepaD4YbkWUKeiCGQhGULUhNb6Rs0UttBOPv-2YE9dLrvOTNzMu8fRmAa1GRNbXSZIFIKAIJDTTdZUom3KpqJar4QJYVjUP6gerMyeNisujBa9cLw-aEfrHhiMhROfJ7w-T1-i-IZbHayvome8Ol93s70S2-9Y7p9CZF5K2pPotCKzR509QDjw9iCpNRVhtbsK3R2bzUcHqZ0p6U9X-FYh_AToS4Vs0h9MoVBwOz-3eNgz2_TXdzsMvqM_MaF1serI9g6LmJEz7ERuS45pURRUZsJPPnYxjbs8R0BNwq_b1VGnjdmZQh9NHXL0e0g1qZoI4nNF1GiJYvC0lSc02RCw1NjaI6gdEmLKebQWMYOInvpZ4bPJ3BPqXTT8nDOfSbj8_yAvVqk10yknwDSjV2fg
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=LITHOGRAPHIC+APPARATUS&rft.inventor=SCACCABAROZZI+LUIGI&rft.inventor=WINTER+LAURENTIUS&rft.inventor=RIZO+DIAGO+PEDRO&rft.inventor=DHALLUIN+FLORIAN+DIDIER+ALBIN&rft.inventor=ARIAS+ESPINOZA+JUAN+DIEGO&rft.inventor=BROUNS+DERK+SERVATIUS+GERTRUDA&rft.inventor=WILEY+JAMES+NORMAN&rft.date=2014-09-30&rft.externalDBID=A&rft.externalDocID=NL2012362A