LITHOGRAPHIC APPARATUS

The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

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Bibliographic Details
Main Authors SCACCABAROZZI LUIGI, WINTER LAURENTIUS, RIZO DIAGO PEDRO, DHALLUIN FLORIAN DIDIER ALBIN, ARIAS ESPINOZA JUAN DIEGO, BROUNS DERK SERVATIUS GERTRUDA, WILEY JAMES NORMAN
Format Patent
LanguageEnglish
Published 30.09.2014
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.
Bibliography:Application Number: NL20142012362