IMPRINT LITHOGRAPHY

• Main Authors: KOOLE, ROELOF, KRUIJT-STEGEMAN, YVONNE, WUISTER, SANDER, GLUSHKOV, DENNIS, LOPAEV, DMITRIY, BOEF, ARIE, BANINE, VADIM, RAKHIMOVA, TATYANA, YAKUNIN, ANDREI
• Format: Patent
• Language: English
• Published: 23.09.2011
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING