Lithographic method

• Main Authors: HENRICUS WILHELMUS MARIA VAN BUEL, ALEX FONG, MICHAEL CHARLES ROBLES, JOSEPH J. CONSOLINI, MICHAEL JOSEPHUS EVERT VAN DE MOOSDIJK
• Format: Patent
• Language: Dutch
• Published: 22.06.2009
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; SEMICONDUCTOR DEVICES; THEIR RELEVANT APPARATUS; TRANSPORTING