COLUMN AND USE THEREOF

A low vapour load reaction column comprises one or more bubble plates 1 with immersion caps 2 of which the side edges comprise openings or perforations 3 for the passage of the gas phase, one or more immersed inlets 5, one or more outlets 7 and, optionally, inflow and outflow weirs 6, 8, characteris...

Full description

Saved in:
Bibliographic Details
Main Authors NORBERT BREMUS, LUTZ JEROMIN, EBERHARD PEUKERT
Format Patent
LanguageEnglish
Published 31.12.1986
Edition4
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A low vapour load reaction column comprises one or more bubble plates 1 with immersion caps 2 of which the side edges comprise openings or perforations 3 for the passage of the gas phase, one or more immersed inlets 5, one or more outlets 7 and, optionally, inflow and outflow weirs 6, 8, characterised in that it has an internal diameter of from 500 to 3000 mm and one or more orifices (4) below each bubble cap (2) of which the openings in the plate (1) are designed in such away that the dry pressure loss occurring under the particular conditions under which the column is operated are 15 times to 60 times greater than the pressure difference between the pressure of the liquid column at the outlet and the pressure of the liquid column at the inlet. This column is particularly suitable for the continuous catalytic esterification of aliphatic carboxylic acids of 2 to 24 carbon atoms with alcohols in countercurrent, and for transesterifications.
Bibliography:Application Number: MY19860000317