METHODS FOR PURIFYING 5-(HALOMETHYL)FURFURAL

The present disclosure provides methods for purifying a 5-(halomethyl)furfural composition, including 5-(chloromethyl)furfural, at operating conditions that decrease or minimize the decomposition or degradation of 5-(chloromethyl)furfural during the process. The methods may employ certain solvents,...

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Main Authors MASUNO, MAKOTO N, SMITH, RYAN L, BROWNING, SHAWN M, WOOD, ALEX B, BISSELL, JOHN, HIRSCH-WEIL, DIMITRI A
Format Patent
LanguageEnglish
Published 24.03.2023
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Summary:The present disclosure provides methods for purifying a 5-(halomethyl)furfural composition, including 5-(chloromethyl)furfural, at operating conditions that decrease or minimize the decomposition or degradation of 5-(chloromethyl)furfural during the process. The methods may employ certain solvents, operating conditions, and/or techniques (e.g., gas stripping). The gaseous 5-(halomethyl)furfural produced from the process can be condensed or deposited to yield 5-(halomethyl)furfural in liquid or solid form. The solid 5-(halomethyl)furfural may be amorphous or crystalline.
Bibliography:Application Number: MY2015PI02298