Gas Wiping Method and Gas Wiping Apparatus

• Main Authors: Tooru OOHASHI, Shinichi FUKUOKA, Yoshihiro SUEMUNE, Yoko AMANO
• Format: Patent
• Language: English
• Published: 08.10.2018
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

GAS WIPING METHOD AND GAS WIPING APPARATUS A gas wiping apparatus includes a pair of wiping nozzles which are disposed so as to face each other and interpose a coated steel sheet therebetween in a thickness direction of the coated steel sheet, and each of which ejects a wiping gas along a width direction of the coated steel sheet; a gas shield plate that is disposed at a position which separates toward an outside from each end portion of the coated steel sheet so that the gas shield plate is interposed between the pair of wiping nozzles; and a side nozzle that ejects a gas to form a gas flow along each surface of the gas shield plate in a direction reverse to a direction in which the coated steel sheet is pulled upward.