POLISHING COMPOSITION AND POLISHING METHOD

A polishing composition of the present invention includes alumina, colloidal silica, citric acid, an organic acid other than citric acid, an oxidizing agent, and water. When the polishing composition is used in polishing the surface of a substrate for a magnetic disk, the substrate is polished at a...

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Bibliographic Details
Main Authors JIE LIN, W. SCOTT RADER
Format Patent
LanguageEnglish
Published 30.08.2016
Subjects
ADHESIVES
CHEMISTRY
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
PHYSICS
POLISHES
POLISHING
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
TRANSPORTING
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Summary:A polishing composition of the present invention includes alumina, colloidal silica, citric acid, an organic acid other than citric acid, an oxidizing agent, and water. When the polishing composition is used in polishing the surface of a substrate for a magnetic disk, the substrate is polished at a high rate, and the substrate after polishing has reduced surface defects.
Bibliography:Application Number: MY2004PI05374