IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS

ONE EMBODIMENT OF THE PRESENT INVENTION IS AN IMPRINT TEMPLATE (40) FOR IMPRINT LITHOGRAPHY THAT COMPRISES ALIGNMENT MARKS (405I-405N; 406I-406N) EMBEDDED IN BULK MATERIAL OF THE IMPRINT TEMPLATE (40).

Saved in:
Bibliographic Details
Main Authors STEPHEN C. JOHNSON, BRITAIN J. SMITH, JOHN G. EKERDT, MATTHEW E. COLBURN, BYUNG-JIN CHOI, TODD C. BAILEY, CARLTON G. WILLSON, SIDLGATA V. SREENIVASAN
Format Patent
LanguageEnglish
Published 30.06.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:ONE EMBODIMENT OF THE PRESENT INVENTION IS AN IMPRINT TEMPLATE (40) FOR IMPRINT LITHOGRAPHY THAT COMPRISES ALIGNMENT MARKS (405I-405N; 406I-406N) EMBEDDED IN BULK MATERIAL OF THE IMPRINT TEMPLATE (40).
Bibliography:Application Number: MY2004PI03793