CONTROLLED ELECTROCHEMICAL POLISHING METHOD

THE INVENTION RELATES TO A METHOD OF POLISHING A SUBSTRATE COMPRISING AT LEAST ONE METAL LAYER BY APPLYING AN ELECTROCHEMICAL POTENTIAL BETWEEN THE SUBSTRATE AND AT LEAST ONE ELECTRODE IN CONTACT WITH A POLISHING COMPOSITION COMPRISING A REDUCING AGENT OR AN OXIDIZING AGENT.

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Bibliographic Details
Main Authors VLASTA BRUSIC, PAUL FEENEY
Format Patent
LanguageEnglish
Published 13.04.2012
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
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Summary:THE INVENTION RELATES TO A METHOD OF POLISHING A SUBSTRATE COMPRISING AT LEAST ONE METAL LAYER BY APPLYING AN ELECTROCHEMICAL POTENTIAL BETWEEN THE SUBSTRATE AND AT LEAST ONE ELECTRODE IN CONTACT WITH A POLISHING COMPOSITION COMPRISING A REDUCING AGENT OR AN OXIDIZING AGENT.
Bibliography:Application Number: MY2006PI02746