POLISHING COMPOSITION

• Main Authors: TOSHIYA HAGIHARA, SHIGEAKI TAKASHINA, YUICHI HONMA, HIROYUKI YOSHIDA
• Format: Patent
• Language: English
• Published: 16.07.2010
• Subjects: ADHESIVES; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES; TOOLS FOR GRINDING, BUFFING, OR SHARPENING; TRANSPORTING

THE PRESENT INVENTION RELATES TO A POLISHING COMPOSITION CONTAINING AN AQUEOUS MEDIUM AND SILICA PARTICLES, WHEREIN THE SILICA PARTICLES IN THE POLISHING COMPOSITION HAS A ZETA POTENTIAL OF FROM -15 TO 40 MV; A METHOD FOR MANUFACTURING A SUBSTRATE INCLUDING THE STEP OF POLISHING A SUBSTRATE TO BE POLISHED WITH A POLISHING COMPOSITION CONTAINING AN AQUEOUS MEDIUM AND SILICA PARTICLES, WHEREIN THE SILICA PARTICLES IN THE POLISHING COMPOSITION HAS A ZETA POTENTIAL OF FROM -15 TO 40 MV; AND A METHOD FOR REDUCING SCRATCHES ON A SUBSTRATE TO BE POLISHED WITH A POLISHING COMPOSITION CONTAINING AN AQUEOUS MEDIUM AND SILICA PARTICLES, INCLUDING THE STEP OF ADJUSTING A ZETA POTENTIAL OF SILICA PARTICLES IN THE POLISHING COMPOSITION TO -15 TO 40 MV. THE POLISHING COMPOSITION CAN BE FAVORABLY USED IN POLISHING THE SUBSTRATE FOR PRECISION PARTS, INCLUDING SUBSTRATES FOR MAGNETIC RECORDING MEDIA SUCH AS MAGNETIC DISCS, OPTICAL DISCS AND OPTO-MAGNETIC DISCS; PHOTOMASK SUBSTRATES; OPTICAL LENSES; OPTICAL MIRRORS; OPTICAL PRISMS; SEMICONDUCTOR SUBSTRATES; AND THE LIKE.