POLISHING COMPOSITION

• Main Authors: TOSHIYA HAGIHARA, YOSHIAKI OSHIMA, KENICHI SUENAGA
• Format: Patent
• Language: English
• Published: 30.04.2008
• Subjects: ADHESIVES; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; PHYSICS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES; TRANSPORTING

A POLISHING COMPOSITION FOR MEMORY HARD DISK CONTAINING WATER AND SILICA PARTICLES,WHEREIN THE SILICA PARTICLES HAVE A PARTICLE SIZE DISTRIBUTION IN WHICH THE RELATIONSHIP OF A PARTICLES SIZE (R) AND A CUMULATIVE VOLUME FREQUENCY (V) IN A GRAPH OF PARTICLE SIZE-CUMULATIVE VOLUME FREQUENCY OBTAINED BY PLOTTING A CUMULATIVE VOLUME FREQUENCY (%) OF THE SILICA PARTICLES COUNTED FROM A SMALL PARTICLE SIZE SIDE AGAINST A PARTICLE SIZE (NM) OF THE SILICA PARTICLES IN THE RANGE OF PARTICLES SIZES OF FROM 40 TO 100 NM SATISFY THE FOLLOWING FORMULA (1): V > 0.5 X R + 40 (1), WHEREIN THE PARTICLES SIZE IS DETERMINED BY OBSERVATION WITH A TRANSMISSION ELECTRON MICROSCOPE (TEM). THE POLISHING COMPOSITION OF THE PRESENT INVENTION CAN BE EVEN MORE SUITABLY USED FOR THE MANUFACTURE OF A SUBSTRATE FOR PRECISION PARTS SUCH AS SUBSTRATES FOR MEMORY HARD DISKS.