POLISHING COMPOSITION

• Main Authors: TOSHIYA HAGIHARA, YOSHIAKI OSHIMA, KENICHI SUENAGA
• Format: Patent
• Language: English
• Published: 29.12.2006
• Subjects: ADHESIVES; CHEMISTRY; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES; TRANSPORTING

A POLISHING COMPOSITION FOR A SUBSTRATE FOR MEMORY HARD DISK, COMPRISING SILICA PARTICLES IN AN AQUEOUS MEDIUM, WHEREIN THE SILICA PARTICLES SATISFY A SPECIFIED RELATIONSHIP BETWEEN AN AVERAGE PARTICLE SIZE OF THE SILICA PARTICLES ON THE NUMBER BASIS AND A STANDARD DEVIATION ON THE NUMBER BASIS, WHEREIN THE AVERAGE PARTICLE SIZE IS OBTAINED BY A DETERMINATION BY TRANSMISSION ELECTRON MICROSCOPE (TEM) OBSERVATION, AND WHEREIN A PARTICLE SIZE AND A CUMULATIVE VOLUME FREQUENCY IN A RANGE OF PARTICLE SIZES OF FROM 60 TO 120 NM SATISFIES A SPECIFIED RELATIONSHIP; A METHOD OF REDUCING MICROWAVINESS OF A SUBSTRATE FOR MEMORY HARD DISK, COMPRISING THE STEP OF POLISHING AN NI-P PLATED SUBSTRATE FOR MEMORY HARD DISK WITH THE POLISHING COMPOSITION. THE METHOD CAN BE SUITABLY USED FOR THE MANUFACTURE OF A SUBSTRATE FOR PRECISION PARTS, SUCH AS A SUBSTRATE FOR MEMORY HARD DISK.(FIG.1)