POLISHING COMPOSITION AND METHOD FOR PRODUCING A MEMORY HARD DISK

A POLISHING COMPOSITION FOR A MEMORY HARD DISK, WHICH COMPRISES AT LEAST THE FOLLOWING COMPONENTS (A) TO (D): (A) FROM 0.1 TO 50 WT%, BASED ON THE TOTAL AMOUNT OF THE POLISHING COMPOSITION, OF AT LEAST ONE ABRASIVE SELECTED FROM THE GROUP CONSISTING OF SILICON DIOXIDE, ALUMINUM OXIDE, CERIUM OXIDE,...

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Bibliographic Details
Main Authors TOSHIKI OWAKI, DAVID M. SHEMO, W. SCOTT RADER
Format Patent
LanguageEnglish
Published 28.01.2006
Subjects
ADHESIVES
CHEMISTRY
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F
DYES
INORGANIC CHEMISTRY
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
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Summary:A POLISHING COMPOSITION FOR A MEMORY HARD DISK, WHICH COMPRISES AT LEAST THE FOLLOWING COMPONENTS (A) TO (D): (A) FROM 0.1 TO 50 WT%, BASED ON THE TOTAL AMOUNT OF THE POLISHING COMPOSITION, OF AT LEAST ONE ABRASIVE SELECTED FROM THE GROUP CONSISTING OF SILICON DIOXIDE, ALUMINUM OXIDE, CERIUM OXIDE, ZIRCONIUM OXIDE, TITANIUM OXIDE, SILICON NITRIDE AND MANGANESE DIOXIDE, (B) FROM 0.001 TO 10 WT%, BASED ON THE TOTAL AMOUNT OF THE POLISHING COMPOSITION, OF AT LEAST ONE PERIODATE SELECTED FROM THE GROUP CONSISTING OF PERIODIC ACID, POTASSIUM PERIODATE, SODIUM PERIODATE AND LITHIUM PERIODATE, (C) FROM 0.01 TO 30 WT%, BASED ON THE TOTAL AMOUNT OF THE POLISHING COMPOSITION, OF AT LEAST ONE PEROXYDISULFATE SALT SELECTED FROM THE GROUP CONSISTING OF AMMONIUM PEROXYDISULFATE, POTASSIUM PEROXYDISULFATE AND SODIUM PEROXYDISULFATE, AND (D) WATER, AND WHICH HAS A PH OF FROM 2 TO 7.
Bibliography:Application Number: MY2001PI00138