ENHANCED MOISTURIZER DEPOSITION IN CLEANSING LIQUIDS CONTAINING HYDROPHOBICALLY OR NON-HYDROPHOBICALLY MODIFIED ANIONIC POLYMERS

The invention relates to compositions comprising hydrophobically and non-hydrophobially modified cross-linked anionic polymers which have been found to minimally hinder deposition of moisturizers in compositions comprising cationic deposition polymers. La invención se relaciona con composiciones que...

Full description

Saved in:
Bibliographic Details
Main Authors VASUDEVAN Tirucherai Varahan, DOUGHERTY Lindsay Kaitlin, MILLER Jamie Lynn
Format Patent
LanguageEnglish
Spanish
Published 19.04.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The invention relates to compositions comprising hydrophobically and non-hydrophobially modified cross-linked anionic polymers which have been found to minimally hinder deposition of moisturizers in compositions comprising cationic deposition polymers. La invención se relaciona con composiciones que comprenden polímeros aniónicos reticulados modificados hidrofóbicamente y no hidrofóbicamente que se ha encontrado que dificultan mínimamente la deposición de hidratantes en composiciones que comprenden polímeros de deposición catiónicos.
Bibliography:Application Number: MX20210001175