PROCESS AND PLANT FOR OBTAINING COLORED GLAZING

• Main Authors: Liubov MAGDENKO-SAVOUREY, Rosiana AGUIAR
• Format: Patent
• Language: English; Spanish
• Published: 06.09.2018
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GLASS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Process for depositing a coating on a glass substrate, said process being characterized by a step in which, in one and the same chamber of the vacuum deposition device, a first constituent made from a material consisting of an oxide, a nitride or an oxynitride of a first element and a second constituent consisting of the metal form of a second element are simultaneously co-sprayed through a plasma, and a step in which a hydride, halide or an organic compound of a third element, different from the first element, is introduced into said plasma so as to recover, at the outlet of said device, said substrate covered with said coating comprising said first, second and third elements at the outlet of the device, said coating consisting of metal nanoparticles of the second element dispersed in an inorganic matrix of said first and third elements, said coating having a plasmon absorption peak in the visible range, said peak being optionally obtained by means of a supplementary heat treatment step if necessary. Plant for implementing said process. Un proceso para depositar un revestimiento en un sustrato de vidrio, el proceso se caracteriza por una etapa en la que los siguientes se co-pulverizan simultáneamente por un plasma, en una y la misma cámara del dispositivo para deposición al vacío: - un primer componente hecho de un material que consiste de un óxido, un nitruro o un oxinitruro de un primer elemento, y - un segundo componente que consiste de la forma metálica de un segundo elemento, y una etapa en la cual un hidruro, un haluro o un compuesto orgánico de un tercer elemento, diferente del primer elemento, se introduce en ese plasma, de manera que recobre el sustrato cubierto con el revestimiento que comprende los elementos primero, segundo y tercero en la salida del dispositivo, el revestimiento consiste de nanopartículas de metal del segundo elemento dispersas en una matriz inorgánica del primer y tercer elementos, el revestimiento muestra un pico de absorción de plasmón en la región visible, el pico se obtiene opcionalmente por medio de una etapa adicional de tratamiento térmico si es necesario.