LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF

The subject matter of the invention is (meth)acrylic polymers comprising a linear or branched C8, or more, fatty chain that may comprise at least one ethylenic unsaturation, which have a weight-average molecular mass (formula I) of less than 20 000 g/mol, which are free of sulphur-containing, metall...

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Bibliographic Details
Main Authors NELLY DOLMAZON, YVAN STORET, FREDERIC TORT, JOSE SANTIAGO
Format Patent
LanguageEnglish
Spanish
Published 08.02.2012
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Summary:The subject matter of the invention is (meth)acrylic polymers comprising a linear or branched C8, or more, fatty chain that may comprise at least one ethylenic unsaturation, which have a weight-average molecular mass (formula I) of less than 20 000 g/mol, which are free of sulphur-containing, metallic and halogenated compounds and the degree of residual monomers of which, measured by GPC, is less than or equal to 10% by mass, preferably less than or equal to 7% by mass. The subject matter of the invention is also the process for synthesizing said polymers and the use of said polymers. La invención tiene por objeto polímeros (meta) crílicos de cadena grasa lineal o ramificada en C8 o más, que pueden contener al menos una insaturación etilénica, con una masa molecular media en pesoMwinferior a 20 000 g/mol, exentos de compuestos azufrados, metálicos y halógenos y cuya concentración de monómeros residuales medida por GPC es inferior o igual al 10% másico, de preferencia inferior o igual al 7% másico. La invención también tiene por objeto el procedimiento de síntesis y su utilización.
Bibliography:Application Number: MX20110010048