PYRAZOLE DERIVATIVE AND INSECTICIDAL AND MITICIDAL COMPOSITION CONTAINING THE DERIVATIVE AS ACTIVE INGREDIENT

• Main Authors: MANA, NISHIMATA, SHUKO, OKUI, YOJI, TAKAHASHI, TOSHIKI, FUKUCHI, ITARU, OKADA
• Format: Patent
• Language: English; Korean
• Published: 16.09.1996
• Edition: 6
• Subjects: CHEMISTRY; HETEROCYCLIC COMPOUNDS; METALLURGY; ORGANIC CHEMISTRY

내용없음 A pyrazole derivative represented by the following formula (I): wherein R and R independently represent a hydrogen atom or a C1-C4 alkyl group; R represents a hydrogen atom, a C1-C4 alkyl group, a phenyl group or a benzyl group, which bonds to one of the nitrogen atoms of the pyrazole ring; R and R independently represent a hydrogen atom, a C1-C4 alkyl group or a phenyl group; R and R independently represent a hydrogen atom, a halogen atom, a C1-C6 alkyl group, a C3-C6 cycloalkyl group, a C1-C4 alkoxy group, a C1-C4 halogenoalkoxy group,a C1-C4 hydroxyalkoxy group, a C2-C7 alkoxyalkoxy group, a nitro group, a trifluoromethyl group, a phenyl group, a phenoxy group, a benzyloxy group, an amino group, a C1-C4 alkylamino group, a C2-C8 dialkylamino group, a cyano group, a carboxyl group, a C2-C5 alkoxycarbonyl group, a C4-C7 cycloalkoxycarbonyl group, a C3-C9 alkoxyalkoxycarbonyl group, a C2-C7 alkylaminocarbonyl group, a C3-C11 dialkylaminocarbonyl group, a piperidinocarbonyl group, a morpholinocarbonyl group, a trimethylsilyl group, a C1-C4 alkylthio group, a C1-C4 alkylsulfinyl group or a C1-C4 alkylsulfonyl group; " X represents an oxygen atom, a sulfur atom, NHO or NR wherein R represents a hydrogen atom or a C1-C4 alkyl group; Y represents an oxygen atom or a sulfur atom; m represents 1 or 2; and n represents 0 or 1, and an insecticidal or miticidal composition containing the derivative as the effective ingredient are disclosed. The pyrazole derivative of the present invention has an excellent controlling effect also against harmful insects and mites exhibiting resistance to conventional insecticides and does not disturb the ecosystem since it is less toxic and less residual.