PROJECTION EXPOSURE METHOD AND AN OPTICAL MASK FOR USE IN PROJECTION EXPOSURE

요약없슴 A projection exposure method includes the steps of (a) irradiating a light from a light source (9) on an optical mask (4, 104), where the optical mask includes a main space (6, 106) which transmits light and has a desired exposure pattern, and a sub space (7, 110, 111) which transmits light and...

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Bibliographic Details
Main Authors ISAMU, HANYU, MITSUJI, NUNOKAWA, SATORU, ASAI
Format Patent
LanguageEnglish
Korean
Published 25.07.1996
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:요약없슴 A projection exposure method includes the steps of (a) irradiating a light from a light source (9) on an optical mask (4, 104), where the optical mask includes a main space (6, 106) which transmits light and has a desired exposure pattern, and a sub space (7, 110, 111) which transmits light and is provided adjacent to the main space, and (b) exposing a photoresist layer (2) by the light which is transmitted through the optical mask (4, 104) via a lens (3) so as to project an optical image of the main space (6, 106), where the sub space (7, 110, 111) has a narrow width such that the light transmitted through the sub space by itself does not expose the photosensitive layer (2).
Bibliography:Application Number: KR19920002401