ANTIREFLECTIVE COATING FILMS
Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer fo...
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Main Authors | , , , , |
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Format | Patent |
Language | English Korean |
Published |
13.02.1996
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist. |
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Bibliography: | Application Number: KR19920011400 |