DEVELOPER COMPOSITION FOR SOLVENT-DEVELOPABLE PHOTORESIST COATINGS

The present specification describes an aqueous developer composition which can develop solvent developable photosensitive materials and comprises a surfactant, a terpene and water, in defined proportions. In a preferred form, the composition includes about 0.5-10% by wt. of a surfactant, and about 0...

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Bibliographic Details
Main Authors TSENG KENNETH K.S, HUNG PAUL L.K
Format Patent
LanguageEnglish
Korean
Published 16.08.1991
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CINEMATOGRAPHY
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTED CIRCUITS
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Summary:The present specification describes an aqueous developer composition which can develop solvent developable photosensitive materials and comprises a surfactant, a terpene and water, in defined proportions. In a preferred form, the composition includes about 0.5-10% by wt. of a surfactant, and about 0.2-10% by wt. of a terpene, the rest being water. Most preferably, the composition comprises about 3-6% by wt. of a surfactant, and about 4-8% by wt. of a terpene, the rest being water. The surfactant is preferably a non-ionic surfactant or mixture thereof, and the terpene is d-limonene. A concentrate formulation also is provided herein from which the aqueous developer composition may be made by dilution with water, usually in an amount of about five to ten times of the concentrate.
Bibliography:Application Number: KR19890003456