METHOD AND APPARATUS FOR DETECTING DEFECT IN CIRCUIT PATTERN OF A MASK FOR X-RAY EXPOSURE

• Main Authors: KUNI ASAHIRO, FUSIMI SATORU, KUBODA HITOSI, NAKAGAWA YASUO, KOSISIBA HIROYA
• Format: Patent
• Language: English; Korean
• Published: 17.11.1990
• Edition: 5
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

The pattern defect detecting apparatus using a scanning and transmission electron microscope. A condenser lens focuses the electron beam generated by the electron gun and a coil deflects the electron beam focused by the condenser lens. An objective lens further foucses the electron beam onto a fixed spot. An XY stage is movable in X and Y directions in a step and repeat manner. A sample chamber houses the XY stage in vacuum. An electron beam detector is fixed to the sample chamber.