METHOD AND APPARATUS FOR DETECTING DEFECT IN CIRCUIT PATTERN OF A MASK FOR X-RAY EXPOSURE

The pattern defect detecting apparatus using a scanning and transmission electron microscope. A condenser lens focuses the electron beam generated by the electron gun and a coil deflects the electron beam focused by the condenser lens. An objective lens further foucses the electron beam onto a fixed...

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Bibliographic Details
Main Authors KUNI ASAHIRO, FUSIMI SATORU, KUBODA HITOSI, NAKAGAWA YASUO, KOSISIBA HIROYA
Format Patent
LanguageEnglish
Korean
Published 17.11.1990
Edition5
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TESTING
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Summary:The pattern defect detecting apparatus using a scanning and transmission electron microscope. A condenser lens focuses the electron beam generated by the electron gun and a coil deflects the electron beam focused by the condenser lens. An objective lens further foucses the electron beam onto a fixed spot. An XY stage is movable in X and Y directions in a step and repeat manner. A sample chamber houses the XY stage in vacuum. An electron beam detector is fixed to the sample chamber.
Bibliography:Application Number: KR19870004364