말단 봉지 폴리머를 포함하는 레지스트 하층막 형성 조성물

• Main Authors: OGATA HIROTO, HIROHARA TOMOTADA
• Format: Patent
• Language: Korean
• Published: 06.09.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

원하는 레지스트패턴을 형성할 수 있는 레지스트 하층막을 형성하기 위한 조성물, 및 이 레지스트 하층막 형성 조성물을 이용한 레지스트패턴 제조방법, 반도체장치의 제조방법을 제공한다. 유기용매, 및 폴리머를 포함하고, 상기 폴리머가, 헤테로원자를 포함하는 기에 의해 중단되어 있을 수도 있고, 치환기로 치환되어 있을 수도 있는 비환상 지방족 탄화수소기를 말단에 갖는, 레지스트 하층막 형성 조성물이다. The present invention provides a composition for forming a resist underlayer film in which a desired resist pattern can be formed, a method for manufacturing a resist pattern using said composition for forming a resist underlayer film, and a method for manufacturing a semiconductor device. The present invention is a composition for forming a resist underlayer film, the composition including an organic solvent and a polymer, the polymer containing, at the terminal, a non-cyclic aliphatic hydrocarbon group that may be interrupted by a group including a heteroatom and that may be substituted by a substitution group.