VALVE PULSING TO CONTROL PRECURSOR PRESSURE

• Main Authors: O'REILLY ANDREW, LI CHEN, WINKLER JERELD LEE, PAULL RYAN, TRIVEDI GNYANESH, BOOCHAKRAVARTHY ASHWIN AGATHYA
• Format: Patent
• Language: English; Korean
• Published: 24.07.2024
• Subjects: ACTUATING-FLOATS; BASIC ELECTRIC ELEMENTS; BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COCKS; CONTROLLING; DEVICES FOR VENTING OR AERATING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; PHYSICS; REGULATING; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES; TAPS; THERMAL INSULATION IN GENERAL; VALVES; WEAPONS

밸브 펄스화를 사용하여 기판 또는 기타 처리의 일부로서 전구체 압력을 제어하도록 구성된 반응기 시스템. 반응기 시스템 내의 제어기는 압력 제어 모듈을 실행하여 반응 챔버와 전구체 공급원 용기 사이에 배치된 어큐뮬레이터 내의 압력을 감지하는 압력 센서로부터 압력 신호를 처리한다. 어큐뮬레이터에 대한 압력 설정점 및 감지된 압력 피드백에 기반하여, 제어기는 밸브 제어 또는 밸브 펄스화 신호를 생성하여 전구체 공급원 용기로부터 기체(예, 전구체)에 의한 어큐뮬레이터 충진을 제어하는 데 사용되는 하나 이상의 충진 밸브를 작동시킨다. 충진 밸브는 고온 적용분야에서 완전히 개방되거나 완전히 폐쇄되어 작동하도록 구성된 고속 다이어프램 밸브일 수 있고, 제어 신호는 밸브가 신속하게 펄스 개방 및 폐쇄되어 어큐뮬레이터 내의 압력을 조정하게 한다. A reactor system configured to use valve pulsing to control precursor pressure as part of substrate or other processing. A controller in the reactor system runs a pressure control module to process pressure signals from a pressure sensor sensing pressure within an accumulator disposed between a reaction chamber and a precursor source vessel. Based on a pressure set point for the accumulator and the sensed pressure feedback, the controller generates valve control or valve pulsing signals to operate one or more fill valves used to control fill of the accumulator with gas (e.g., precursor) from the precursor source vessel. The fill valves may be high-speed diaphragm valves configured for operation in high temperature applications to be fully opened or fully closed, and the control signals cause the valves to rapidly pulse open and closed to adjust the pressure within the accumulator.