VAPOR DEPOSITION APPARATUS AND METHOD FOR COATING A SUBSTRATE IN A VACUUM CHAMBER

• Main Authors: LOPP ANDREAS, ISHIKAWA DAVID, UPADHYE BAHUBALI S, BANGERT STEFAN, SIVARAMAKRISHNAN VISWESWAREN, ACHARYA SUMEDH
• Format: Patent
• Language: English; Korean
• Published: 04.07.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

기상 증착 장치가 설명된다. 기상 증착 장치는, 챔버 벽들을 갖는 진공 챔버; 챔버 벽들을 차폐하도록 구성된 온도 제어 차폐부; 코팅될 기판을 향하는 열 차폐부 － 열 차폐부는 하나 이상의 개구들을 가짐 －; 및 진공 챔버 내에 적어도 부분적으로 있는 증발기를 포함하며, 증발기는, 하나 이상의 개구들을 통해 연장되는 하나 이상의 노즐들을 포함한다. A vapor deposition apparatus is described. The vapor deposition apparatus includes a vacuum chamber having chamber walls; a temperature controlled shield configured to shield the chamber walls; a heat shield facing a substrate to be coated, the heat shield having one or more openings; and an evaporator at least partially within the vacuum chamber, the evaporator comprising: one or more nozzles extending through the one or more openings.