기판들의 열 프로세싱을 보정하기 위한 시스템들, 방법들 및 장치

• Main Authors: MAYUR ABHILASH J, ADERHOLD WOLFGANG R, WANG YI
• Format: Patent
• Language: Korean
• Published: 30.04.2024
• Subjects: BASIC ELECTRIC ELEMENTS; BLASTING; CALCULATING; COLORIMETRY; COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS; COMPUTING; CONTROLLING; COUNTING; ELECTRIC HEATING; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FURNACES; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; HEATING; KILNS; LIGHTING; MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT; MEASURING; MECHANICAL ENGINEERING; OPEN SINTERING OR LIKE APPARATUS; OVENS; PHYSICS; RADIATION PYROMETRY; REGULATING; RETORTS; SEMICONDUCTOR DEVICES; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES; TESTING; WEAPONS

본 개시내용의 양상들은 기판들의 열 프로세싱을 보정하기 위한 시스템들, 방법들 및 장치에 관한 것이다. 일 양상에서, 복수의 보정 흡수 팩터들을 갖는 보정 흡수 팩터 곡선이 생성된다. Aspects of the present disclosure relation to systems, methods, and apparatus for correcting thermal processing of substrates. In one aspect, a corrective absorption factor curve having a plurality of corrective absorption factors is generated.