METAL PLATE FOR MANUFACTURING VAPOR DEPOSITION MASK MANUFACTURING METHOD OF METAL PLATE VAPOR DEPOSITION MASK MANUFACTURING METHOD OF VAPOR DEPOSITION MASK AND VAPOR DEPOSITION MASK APPARATUS EQUIPPED WITH VAPOR DEPOSITION MASK

• Main Authors: USHIKUSA MASATO, HATSUTA CHIAKI, MATSUURA SACHIYO, IKENAGA CHIKAO, OKA HIROKI, OKAMOTO HIDEYUKI
• Format: Patent
• Language: English; Korean
• Published: 28.03.2024
• Subjects: ALLOYS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; FERROUS OR NON-FERROUS ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVINGMATERIAL; METALLURGY; PERFORMING OPERATIONS; PUNCHING METAL; ROLLING OF METAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS

증착 마스크를 제조하기 위해 사용되는 금속판은, 30㎛ 이하의 두께를 갖는다. 금속판의 단면에 나타나는 결정립을 EBSD법으로 측정하고, 측정 결과를 해석함으로써 산출되는, 결정립의 평균 단면적은 0.5㎛2 이상이면서 50㎛2 이하이다. 평균 단면적은, EBSD법에 의해 얻어진 측정 결과를, 결정 방위의 차가 5도 이상인 부분을 결정립계라고 인정하는 조건 하에서 에어리어법에 의해 해석함으로써 산출된다. A metal plate used for manufacturing a deposition mask has a thickness of equal to or less than 30 µm. An average cross-sectional area of the crystals grains on a cross section of the metal plate is from 0.5 µm2to 50 µm2. The average cross-sectional area of crystal grains is calculated by analyzing measurement results obtained by an EBSD method, the measuring results being analyzed by an area method under conditions where a portion with a difference in crystal orientation of 5 degrees or more is recognized as a crystal grain boundary.