촬상 장치

• Main Author: YOKOCHI KAITO
• Format: Patent
• Language: Korean
• Published: 22.03.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

본 개시의 일 실시 형태의 촬상 장치는, 입사광에 대하여 제1 굴절률을 갖는 제1 필터와, 상기 제1 필터를 투과한 광을 광전 변환하는 제1 광전 변환부와, 입사광에 대하여 상기 제1 굴절률보다도 낮은 제2 굴절률을 갖고, 상기 제1 필터와 인접하는 제2 필터와, 상기 제2 필터를 투과한 광을 광전 변환하는 제2 광전 변환부와, 상기 제1 필터에서 볼 때 상기 제1 광전 변환부와 반대측에 마련되고, 입사광에 대하여 제3 굴절률을 갖는 제1 매질과, 상기 제2 필터에서 볼 때 상기 제2 광전 변환부와 반대측에 마련되고, 입사광에 대하여 상기 제3 굴절률보다도 높은 제4 굴절률을 갖는 제2 매질을 구비한다. This imaging device is provided with: a first filter which has a first refractive index with respect to the incident light; a first photoelectric conversion unit which photoelectrically converts light transmitted through the first filter; a second filter which has a second refractive index lower than the first refractive index with respect to the incident light and which is adjacent to the first filter; a second photoelectric conversion unit which photoelectrically converts light that has passed through the second filter; a first medium which is provided on the side opposite of the first photoelectric conversion unit seen from the first filter and which has a third refractive index with respect to the incident light; and a second medium which is provided on the side opposite of the second photoelectric conversion unit seen from the second filter and which has a fourth refractive index higher than the third refractive index with respect to the incident light.