전자 디바이스 제조용 수용액, 레지스트 패턴의 제조방법 및 디바이스의 제조방법

• Main Authors: YAMAMOTO KAZUMA, YANAGITA HIROSHI, YASHIMA TOMOYASU, ISHII MAKI
• Format: Patent
• Language: Korean
• Published: 15.03.2024
• Subjects: ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES; APPARATUS SPECIALLY ADAPTED THEREFOR; CANDLES; CHEMISTRY; CINEMATOGRAPHY; DETERGENT COMPOSITIONS; DETERGENTS; ELECTROGRAPHY; FATTY ACIDS THEREFROM; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; RECOVERY OF GLYCEROL; RESIN SOAPS; SOAP OR SOAP-MAKING; USE OF SINGLE SUBSTANCES AS DETERGENTS

[과제] 패턴 붕괴를 방지할 수 있거나 레지스트 패턴 폭의 불균일성을 억제할 수 있는 전자 디바이스 제조용 수용액을 제공하는 것. [해결 수단] 알킬카복실산 화합물(A) 및 용매(B)를 포함하는 전자 디바이스 제조용 수용액으로서, 상기 알킬카복실산 화합물(A)은 화학식 a로 나타내어지고, 상기 용매(B)는 물을 포함한다. [화학식 a] A1-COOH 상기 화학식 a에서, A1은 C3-12 알킬이다. [Problem] To provide an electronic device manufacturing aqueous solution, which makes it possible to prevent pattern collapse or suppress non-uniformity of resist pattern width. [Means for Solution] An electronic device manufacturing aqueous solution comprising an alkylcarboxylic acid compound (A) and a solvent (B), wherein the alkylcarboxylic acid compound (A) is represented by the formula (a): A1-COOH (a), wherein A1 is C3-12 alkyl, and the solvent (B) comprises water.