MONOALKYL TIN TRIALKOXIDES AND/OR MONOALKYL TIN TRIAMIDES WITH PARTICULATE CONTAMINATION AND CORRESPONDING METHODS

• Main Authors: GATES CRAIG M, CLARK BENJAMIN L, SMIDDY DOMINICK, GENIZA MARK
• Format: Patent
• Language: English; Korean
• Published: 01.02.2024
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; APPARATUS SPECIALLY ADAPTED THEREFOR; APPARATUS THEREFOR; CHEMISTRY; CINEMATOGRAPHY; ELECTROGRAPHY; GENERAL METHODS OF ORGANIC CHEMISTRY; HOLOGRAPHY; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PHYSICS; SEPARATION; TRANSPORTING

분별 증류 및/또는 한외 여과를 사용하는 모노알킬 주석 트리알콕사이드 및 모노알킬 주석 트리아미드의 정제가 기술된다. 정제된 조성물은 방사선 감응형 패터닝 조성물 또는 이의 전구체로서 유용하다. 분별 증류 공정은 금속 불순물을 매우 낮은 수준으로 제거하는데 효과적인 것으로 밝혀졌다. 한외 여과 공정은 미세 미립자의 제거에 효과적인 것으로 밝혀졌다. 상업적으로 실용적인 프로세싱 기술이 기술된다. The purification of monoalkyl tin trialkoxides and monoalkyl tin triamides are described using fractional distillation and/or ultrafiltration. The purified compositions are useful as radiation sensitive patterning compositions or precursors thereof. The fractional distillation process has been found to be effective for the removal of metal impurities down to very low levels. The ultrafiltration processes have been found to be effective at removal of fine particulates. Commercially practical processing techniques are described.