METHOD AND APPARATUS FOR SUPPLYING IMPROVED GAS FLOW TO A PROCESSING VOLUME OF A PROCESSING CHAMBER

• Main Authors: OLSEN CHRISTOPHER S, PANDEY VISHWAS KUMAR, SHONO ERIC KIHARA, KIM TAEWAN, TJANDRA AGUS SOFIAN, LO HANSEL, SHAH KARTIK, KAUFMAN OSBORN TOBIN
• Format: Patent
• Language: English; Korean
• Published: 18.12.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

본 개시내용은 일반적으로, 전자 디바이스 제조 프로세스 동안 처리 챔버의 처리 용적에 적어도 준안정 라디칼 분자 종들 및/또는 라디칼 원자 종들을 제공하는 방법들, 및 그에 관련된 장치에 관한 것이다. 일 실시예에서, 장치는 원격 플라즈마 공급원과 처리 챔버 사이에 배치된 가스 주입 조립체이다. 가스 주입 조립체는 몸체, 몸체에 배치된, 가스 혼합 용적을 한정하는 유전체 라이너, 가스 주입 조립체를 처리 챔버에 결합시키기 위한 제1 플랜지, 및 가스 주입 조립체를 원격 플라즈마 공급원에 결합시키기 위한 제2 플랜지를 포함한다. 가스 주입 조립체는 몸체 및 라이너를 통해 형성된 하나 이상의 가스 주입 포트를 더 포함한다. The present disclosure generally provides methods of providing at least metastable radical molecular species and/or radical atomic species to a processing volume of a process chamber during an electronic device fabrication process, and apparatus related thereto. In one embodiment, the apparatus is a gas injection assembly disposed between a remote plasma source and a process chamber. The gas injection assembly includes a body, a dielectric liner disposed in the body that defines a gas mixing volume, a first flange to couple the gas injection assembly to a process chamber, and a second flange to couple the gas injection assembly to the remote plasma source. The gas injection assembly further includes one or more gas injection ports formed through the body and the liner.