광학 적층체, 광학 적층체의 제조 방법, 광학 부재, 광학 장치, 광학 부재의 제조 방법, 및 광학 장치의 제조 방법

• Main Authors: MORISHIMA RYOTA, HATTORI DAISUKE, YOSHIKAWA TAKAHIRO
• Format: Patent
• Language: Korean
• Published: 30.11.2023
• Subjects: ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; ADHESIVES; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS BASED THEREON; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; GENERAL PROCESSES OF COMPOUNDING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; POLISHES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS AS ADHESIVES; WORKING-UP

본 발명은 공극층의 공극에 점착제, 접착제 등이 침투하기 어려운 광학 적층체의 제공을 목적으로 한다. 상기 목적을 달성하기 위해서, 본 발명의 광학 적층체(10a) 또는 (10b)는, 공극층(12)과, 공극층(12) 상에 형성된 저투습층(13)을 포함하고, 저투습층(13)은 금속, 금속산화물, 규소, 규소산화물 및 유기 무기 하이브리드 재료로 이루어지는 군으로부터 선택되는 적어도 하나를 포함하고, 또한 JIS Z 0208-1976에 규정하는 컵법에 의해 측정한 수증기 투과율이 35g/㎡·day 이하인 것을 특징으로 한다. The present invention provides an optical laminate including a void-containing layer in which a pressure-sensitive adhesive, an adhesive, and the like barely permeate a void. In order to achieve the object, an optical laminate (10a) or (10b) of the present invention includes a void-containing layer (12) and a low moisture permeable layer (13) formed on the void-containing layer (12), wherein the low moisture permeable layer (13) includes at least one element selected from the group consisting of metal, metal oxide, silicon, silicon oxide and an organic-inorganic hybrid material, and a moisture vapor transmission rate of the low moisture permeable layer (13) measured by a dish method defined in JIS Z 0208-1976 is 35 g/m2·day or less.