METAL-OXY-FLUORIDE FILMS FOR CHAMBER COMPONENTS

• Main Authors: FENWICK DAVID, ZHAN GUODONG, WU XIAOWEI, RICE MICHAEL R, SUN JENNIFER Y
• Format: Patent
• Language: English; Korean
• Published: 24.10.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Embodiments of the present disclosure generally relate to methods of converting metal fluoride and/or metal oxide coatings to M-O-F layers and coatings. As a chamber component for a processing chamber, the provided article comprises a body having a coating. The coating includes the resulting Y-O-F coating or other yttrium-based oxy-fluoride coating by performing a fluorination process on an yttrium-based oxide coating or by performing an oxidation process on the yttrium-based fluorine coating. 물건은 코팅을 갖는 바디를 포함한다. 코팅은, 이트륨-계 산화물 코팅에 대해 플루오르화 프로세스를 수행함으로써 또는 이트륨-계 불소 코팅에 대해 산화 프로세스를 수행함으로써 생성되는 Y-O-F 코팅 또는 다른 이트륨-계 옥시-플루오라이드 코팅을 포함한다.