PROCESS FOR PRODUCING LENS RADIATION-SENSITIVE COMPOSITION DISPLAY ELEMENT DISPLAY DEVICE SOLID-STATE IMAGING ELEMENT IMAGING DEVICE AND COMPOUND

Provided is a method for producing a lens, that allows a lens shape to be formed by fluidization by heating at low temperatures and that allows a lens with high heat resistance and a high refractive index to be obtained. A lens is produced by a method comprising the steps of: applying a radiation-se...

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Main Authors KODAMA SEIICHIROU, TANAKA KEI, AKIIKE TOSHIYUKI, CHUNG KANG GO, SUZUKI HIROYUKI, KINOSHITA YOSHINORI, HAMAGUCHI HITOSHI, TAKADA YUUKI
Format Patent
LanguageEnglish
Korean
Published 17.10.2023
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Summary:Provided is a method for producing a lens, that allows a lens shape to be formed by fluidization by heating at low temperatures and that allows a lens with high heat resistance and a high refractive index to be obtained. A lens is produced by a method comprising the steps of: applying a radiation-sensitive composition onto a substrate to form a coating film; irradiating a portion of the coating film with radiation; developing the coating film irradiated with the radiation to form a pattern on the substrate; and heating the pattern after the development to form a lens. The radiation-sensitive composition contains: a component (A) that is a compound represented by formula (1); a component (B) that is a photoinitiator; and a component (C) that is a compound having a polymerizable carbon-carbon unsaturated bond (excluding the component (A)). (과제) 저온의 가열에 의한 유동화에 의해 렌즈 형상을 형성할 수 있고, 또한 내열성이 높고 고굴절률인 렌즈를 얻을 수 있는 렌즈의 제조 방법을 제공하는 것. (해결 수단) 기재 상에 감방사선성 조성물을 도포하여 도막을 형성하는 공정과, 도막의 일부에 방사선을 조사하는 공정과, 방사선이 조사된 도막을 현상하여 기재 상에 패턴을 형성하는 공정과, 현상 후의 패턴을 가열하여 렌즈를 형성하는 공정을 포함하는 방법에 의해 렌즈를 제조한다. 감방사선성 조성물은, (A) 성분: 식 (1)로 나타나는 화합물, (B) 성분: 광 중합 개시제 및, (C) 성분: 중합성 탄소-탄소 불포화 결합을 갖는 화합물(단, (A) 성분을 제외한다.)을 함유한다. TIFFpat00039.tif4099
Bibliography:Application Number: KR20230046087