조성물, 기판의 처리 방법

• Main Authors: NARITA MOE, MIZUTANI ATSUSHI
• Format: Patent
• Language: Korean
• Published: 11.10.2023
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING; CLEANING IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

본 발명은, Ru 함유물과 접촉시켜 Ru 함유물을 에칭 처리할 때에, 잔사가 적은 조성물을 제공하는 것, 및, 기판의 처리 방법을 제공하는 것을 과제로 한다. 본 발명의 조성물은, 과아이오딘산 및 그 염으로 이루어지는 군으로부터 선택되는 1종 이상의 과아이오딘산 화합물과, 식 (A)로 나타나는 제4급 암모늄염과, 트라이알킬아민 또는 그 염을 포함한다. JPEGpct00017.jpg5257 The present invention addresses the problem of providing: a composition having a low amount of residue when etching a Ru-containing material by bringing the composition into contact with the Ru-containing material; and a method for treating a substrate. A composition according to the present invention comprises: at least one periodic acid compound selected from the group consisting of a periodic acid, and a salt thereof; a quaternary ammonium salt represented by formula (A); and a trialkylamine or a salt thereof.