Substrate processing apparatus

The present invention relates to a substrate processing device and, more specifically, to a substrate processing device which can detect tilting of a substrate in vertical and/or horizontal directions within a chamber when processing processes such as a drying process for a substrate using supercrit...

Full description

Saved in:
Bibliographic Details
Main Authors JU JUNG MYOUNG, JUNG IN IL, MA HEE JEON, OH SEUNG MIN
Format Patent
LanguageEnglish
Korean
Published 11.09.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GYROSCOPIC INSTRUMENTS
MEASURING
MEASURING DISTANCES, LEVELS OR BEARINGS
NAVIGATION
PHOTOGRAMMETRY OR VIDEOGRAMMETRY
PHYSICS
SEMICONDUCTOR DEVICES
SURVEYING
TESTING
Online AccessGet full text

Cover

More Information
Summary:The present invention relates to a substrate processing device and, more specifically, to a substrate processing device which can detect tilting of a substrate in vertical and/or horizontal directions within a chamber when processing processes such as a drying process for a substrate using supercritical fluid and the like. 본 발명은 기판처리장치에 대한 것으로서, 보다 상세하게는 초임계유체를 이용하여 기판에 대한 건조공정 등의 처리공정을 진행하는 경우에 챔버 내부에서 기판의 수직방향 및/또는 수평방향에 대한 틸팅을 감지할 수 있는 기판처리장치에 대한 것이다.
Bibliography:Application Number: KR20220026508